Next Generation E-Beam Lithography and 3D Nanopattterning for Nanofabrication

Started

Energy Efficiency
Not Energy Related

Equipment

PHYSICAL SCIENCES AND MATHEMATICS (Computer Science and Informatics)
ENGINEERING AND TECHNOLOGY (Electrical and Electronic Engineering)

Not Cross-cutting

Dr H Bhaskaran
Materials
University of Oxford

Standard

EPSRC

01 October 2024

30 September 2026

24 months

£2,198,178

Optics; photonics & lasers

South East

NC : Infrastructure

Dr H Bhaskaran, Materials, University of Oxford

Dr A Ardavan, Oxford Physics, University of Oxford
Dr N Ares, Engineering Science, University of Oxford
Mr RS Bonilla, Materials, University of Oxford
Professor M Krishnan, Oxford Chemistry, University of Oxford
Dr PJ Leek, Oxford Physics, University of Oxford
Professor L Steier, Oxford Chemistry, University of Oxford
Professor RA Taylor, Oxford Physics, University of Oxford
Dr RS Weatherup, Materials, University of Oxford

Oxford's nanofabrication cleanroom (Fab@Oxford, https://fab.ox.ac.uk) hosts a suite of equipment supporting our large nanoscience community. It enables research developing new energy-efficient hardware for AI and Machine Learning; micro- and nano-devices/materials for photonics; experimental metamaterials; nanofluidic devices for ultrafast diagnostics; Micro- and Nano-electromechanical systems (MEMS and NEMS) for sensing and actuation; and more.As the number of users and their needs for more complex fabrication have expanded, we find that a large proportion of users require higher throughput and more reliable E-Beam lithography (EBL), as well as novel 3D nanoprinting capabilities to enable forefront research on interfaces between devices and systems.For the EBL, the present tool has reached the point where it is no longer serviceable resulting in down-time of over five months. It has no advanced features such as autofocusing and is restricted to acceleration voltages of >50 kV resulting in long writing times, exacerbating time pressures on the tool - presently running nearly 24x7. The manufacturer's service contract has failed to cover most recent repairs, as engineers are not trained on such an old instrument. Resolutions approaching 30nm or below have also become very challenging due to the age of the tool. Thus, it is imperative that this underpinning workhorse tool be urgently replaced with a new state-of-the-art EBL to secure the delivery of the current £50M EPSRC research portfolio and continue pushing the community's ability to develop cutting-edge materials and nanoengineering.Specifically, the new EBL will deliver:Scan speed of up to 100MHz, enhancing throughput.Auto calibration to achieve reliable, stable pattern writing for long periods of time.Timing of auto correction to be set for each field or each pattern to allow long period writing without an operator, for example at weekends.Potential to accommodate up to 300mmF wafer and up to 6-inch mask, thus increasing relevance to industrial R&D.In consultation with the wide user community, we have also identified a pressing unmet need in 3D nanopatterning, in particular for complex 3D hybrid circuits to power next generation computer chips, and energy efficient accelerators. A combined EBL alongside a nanoscribe 3D 2-photon system will allow users to build nanoscale parts in 2D (EBL) alongside 3D integration (nanoscribe) particularly for emerging photonic circuits in which Oxford is a world-leader. This suite would significantly increase the research capability available and would be the only such combined capability in the UK, bringing in a larger user base within the University, and elsewhere. Interfacing photonics with electronics is an area of frontier research, and such combined capability is essential to keep UK research at the forefront of this field. The overarching aims of this underpinning multi-user equipment grant is therefore to enhance the researchcapabilities and capacity of the Fab@Oxford facility which currently supports academics across the engineering and physical sciences ensuring that we maintain an enviable lead in all the areas that are currently underpinned by such infrastructure

23/10/24