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Projects: Projects for Investigator
Reference Number InnUK/103445/01
Title ALEGRO: Atomic Layer Deposition and Etching for GaN Power Device Applications
Status Completed
Energy Categories Energy Efficiency(Transport) 50%;
Other Power and Storage Technologies(Electricity transmission and distribution) 50%;
Research Types Applied Research and Development 100%
Science and Technology Fields PHYSICAL SCIENCES AND MATHEMATICS (Chemistry) 40%;
ENGINEERING AND TECHNOLOGY (Electrical and Electronic Engineering) 20%;
UKERC Cross Cutting Characterisation Not Cross-cutting 100%
Principal Investigator Project Contact
No email address given
Oxford Instruments Nanotechnology Tools Ltd
Award Type Collaborative R&D
Funding Source Innovate-UK
Start Date 01 September 2017
End Date 30 November 2018
Duration 15 months
Total Grant Value £266,115
Industrial Sectors
Region South East
Programme Competition Call: 1607_MM_SEMICON_LO - Accelerating the commercial application of compound semiconductors over 100k. Activity Compound - Semiconductor Applications - ISCF
Investigators Principal Investigator Project Contact , Oxford Instruments Nanotechnology Tools Ltd (63.563%)
  Other Investigator Project Contact , University of Glasgow (36.437%)
Web Site
Abstract Electric cars and electric power delivery need efficient electrical switching devices. Semiconductor devices can do this, but also waste some energy when switching. This project plans to demonstrate high voltage switching devices using gallium nitride (GaN), the most significant semiconductor material after silicon, in a novel device format which can operate more efficiently and switch faster than the current device hybrids based on compound semiconductors combined with silicon. Making such devices will require almost atomic precision in etching and depositing layers. The project will further develop atomic layer etching (ALE) and atomic layer deposition (ALD) tools and processes ready for the manufacture of such devices. Oxford Instruments brings its experience as a process tool manufacturer for plasma-enhanced ALD, and its recent innovation in ALE, and will develop these tools and processes. The University of Glasgow will use its expertise in device design and manufacture to demonstrate a process flow for device manufacture.
Publications (none)
Final Report (none)
Added to Database 19/05/20