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Reference Number	InnUK/103445/01
Title	ALEGRO: Atomic Layer Deposition and Etching for GaN Power Device Applications
Status	Completed
Energy Categories	Other Power and Storage Technologies(Electricity transmission and distribution) 50%; Energy Efficiency(Transport) 50%;
Research Types	Applied Research and Development 100%
Science and Technology Fields	PHYSICAL SCIENCES AND MATHEMATICS (Chemistry) 40%; PHYSICAL SCIENCES AND MATHEMATICS (Physics) 40%; ENGINEERING AND TECHNOLOGY (Electrical and Electronic Engineering) 20%;
UKERC Cross Cutting Characterisation	Not Cross-cutting 100%
Principal Investigator	Project Contact No email address given Oxford Instruments Nanotechnology Tools Ltd
Award Type	Collaborative R&D
Funding Source	Innovate-UK
Start Date	01 September 2017
End Date	30 November 2018
Duration	15 months
Total Grant Value	£266,115
Industrial Sectors
Region	South East
Programme	Competition Call: 1607_MM_SEMICON_LO - Accelerating the commercial application of compound semiconductors over 100k. Activity Compound - Semiconductor Applications - ISCF
Investigators	Principal Investigator	Project Contact , Oxford Instruments Nanotechnology Tools Ltd (63.563%)
	Other Investigator	Project Contact , University of Glasgow (36.437%)
Web Site
Objectives
Abstract	Electric cars and electric power delivery need efficient electrical switching devices. Semiconductor devices can do this, but also waste some energy when switching. This project plans to demonstrate high voltage switching devices using gallium nitride (GaN), the most significant semiconductor material after silicon, in a novel device format which can operate more efficiently and switch faster than the current device hybrids based on compound semiconductors combined with silicon. Making such devices will require almost atomic precision in etching and depositing layers. The project will further develop atomic layer etching (ALE) and atomic layer deposition (ALD) tools and processes ready for the manufacture of such devices. Oxford Instruments brings its experience as a process tool manufacturer for plasma-enhanced ALD, and its recent innovation in ALE, and will develop these tools and processes. The University of Glasgow will use its expertise in device design and manufacture to demonstrate a process flow for device manufacture.
Publications	(none)
Final Report	(none)
Added to Database	19/05/20